Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
indgår i Springer Theses serien
- Indbinding:
- Paperback
- Sideantal:
- 137
- Udgivet:
- 30. januar 2019
- Udgave:
- 12018
- Størrelse:
- 155x235x0 mm.
- Vægt:
- 454 g.
Leveringstid:
8-11 hverdage
Forventet levering: 21. november 2024
Beskrivelse af Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material.
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