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Plasma Processes for Semiconductor Fabrication

af W. N. G. Hitchon

indgår i Cambridge Studies in Semiconductor Physics and Microelectronic Engineering serien

Plasma Processes for Semiconductor Fabrication af W. N. G. Hitchon
Bag om Plasma Processes for Semiconductor Fabrication

Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.

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  • Sprog:
  • Engelsk
  • ISBN:
  • 9780521018005
  • Indbinding:
  • Paperback
  • Sideantal:
  • 232
  • Udgivet:
  • 29. september 2005
  • Størrelse:
  • 178x254x14 mm.
  • Vægt:
  • 414 g.
  • 2-3 uger.
  • 2. december 2024
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Beskrivelse af Plasma Processes for Semiconductor Fabrication

Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.

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