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Plasma Etching

- Fundamentals and Applications

Bag om Plasma Etching

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

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  • Sprog:
  • Engelsk
  • ISBN:
  • 9780198562870
  • Indbinding:
  • Hardback
  • Sideantal:
  • 356
  • Udgivet:
  • 28. maj 1998
  • Størrelse:
  • 163x242x23 mm.
  • Vægt:
  • 743 g.
Leveringstid: 2-3 uger
Forventet levering: 2. december 2024

Beskrivelse af Plasma Etching

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

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