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This book focuses on surface activity of electron emission (EE). Prior to protective painting, a steel surface is usually grit blasted or sandblasted to remove scale and contaminants and to roughen the surface. This book emphasizes that such surface treatment causes EE, increasing the strength of paint adhesion. Introduced here are the experimental results of thermally assisted photoelectron emission (TAPE) and tribo-stimulated (rubbing) electron emission (TriboEE) from practical metals after different kinds of surface-treatment processes. A detailed description is given of how Arrhenius activation energies relating to electron transfer through the surface overlayer and also the energy levels of electrons trapped in the overlayer can be obtained, and how TAPE and TriboEE data can be influenced by the chemical properties of that overlayer. This book is composed of four parts: I. Surface treatment processes; II. The principle of EE analysis used for practical surfaces; III. Materials and methods of EE and X-ray photoelectron spectroscopy (XPS); IV. EE and XPS characteristics of practical surfaces. In the last part, the EE and XPS results for metals, semiconductors, and carbon materials are drawn from the author's own publications. The book will be useful for researchers engaging in surface-treatment processes of various materials.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics.

This book gives a representative survey of the state of the art of research on gas-surface interactions. The book presents how modern surface science targets the atomic-level understanding of physical and chemical processes at surfaces, with particular emphasis on dynamical aspects.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

Micro-X-ray fluorescence offers the possibility for a position- sensitive and non-destructive analysis that can be used for the analysis of non-homogeneous materials and layer systems.

As well as coverage of the base concepts in thin film theory, this volume has details of many of the latest results in the field, including materials mixtures and nanostructured coatings. It includes dedicated software packages for materials characterization.

This comprehensive work on pulsed laser ablation explicitly links the principles and methodology to the physical properties of the irradiated materials. From the basics to the most advanced topics, it incorporates the latest theory and experimental data.

This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces.

This new edition provides a state-of-the-art survey of ellipsometric methods used to study organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces.

This book presents developments of techniques for detection and analysis of two electrons resulting from the interaction of a single incident electron with a solid surface.

This is the first ever comprehensive treatment of NEXAFS spectroscopy. It is suitable for novice researchers as an introduction to the field, while experts will welcome the detailed description of state-of-the-art instrumentation and analysis techniques, along with the latest experimental and theoretical results.

This book presents the basics of Auger- and X-Ray Photoelectron Spectroscopy in Materials Science in logical order from sample preparation and instrument setup through data acquisition to data evaluation. Offers guidance on problem-solving and worked examples.

This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics.

This second edition provides a cutting-edge overview of physical, technical and scientific aspects related to the widely used analytical method of confocal Raman microscopy.

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors¿ previous volume ¿Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces,¿ presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

This book gives a representative survey of the state of the art of research on gas-surface interactions. The book presents how modern surface science targets the atomic-level understanding of physical and chemical processes at surfaces, with particular emphasis on dynamical aspects.

This book provides a comprehensive introduction to the methods and variety of Kelvin probe force microscopy, including technical details. It also offers an overview of the recent developments and numerous applications, ranging from semiconductor materials, nanostructures and devices to sub-molecular and atomic scale electrostatics.In the last 25 years, Kelvin probe force microscopy has developed from a specialized technique applied by a few scanning probe microscopy experts into a tool used by numerous research and development groups around the globe. This sequel to the editors' previous volume "Kelvin Probe Force Microscopy: Measuring and Compensating Electrostatic Forces," presents new and complementary topics.It is intended for a broad readership, from undergraduate students to lab technicians and scanning probe microscopy experts who are new to the field.

This second edition provides a cutting-edge overview of physical, technical and scientific aspects related to the widely used analytical method of confocal Raman microscopy.

Crystal growth far from thermodynamic equilibrium is nothing but homoepitaxy - thin film growth on a crystalline substrate of the same material. Because of the absence of misfit effects, homoepitaxy is an ideal playground to study growth kinetics in its pure form.

Using the continuum of interface-induced gap states (IFIGS) as a unifying theme, Moench explains the band-structure lineup at all types of semiconductor interfaces.

Application-oriented book on magnetic recording, focussing on the underlying physical mechanisms that play crucial roles in medium and transducer development for high areal density disk drives.

Application-oriented book on magnetic recording, focussing on the underlying physical mechanisms that play crucial roles in medium and transducer development for high areal density disk drives.

This third edition has been thoroughly revised and updated. In particular it now includes an extensive discussion of the band lineup at semiconductor interfaces. The unifying concept is the continuum of interface-induced gap states.

The conceptual simplicity of the STM technique is startling: bringing a sharp needle to within a few Angstroms of the surface of a conducting sample and using the tunneling cur rent, which flows on application of a bias voltage, to sense the atomic and elec tronic surface structure with atomic resolution!

This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references.

Scanning tunnelling microscopy (STM) is a powerful technique for surface analysis with atomic resolution. The book appeals to researchers, advanced students and analysts in industrial laboratories.

This unified overview of recent progress in a growing, multi-disciplinary field places special emphasis on the industrial applications of magnetic multilayered materials. The text describes a wide range of physical aspects, together with experimental and theoretical methods.

This book, authored by a team of expert Chinese and international authors, covers many aspects of modern electron microscopy, from the architecture of novel electron microscopes, advanced theories and techniques in TEM and sample preparation, to a variety of hands-on examples of TEM applications.

Theindividual chapters - all written by experts in the field -are devoted to the investigation of surface structure,defect shapes and concentrations, the interaction potential,collective and localized surface vibrations at low energies,phase transitions and surface diffusion.